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提出了一种激光诱导液相腐蚀新方法——抗蚀膜掩蔽法。抗蚀膜掩蔽法是指在激光腐蚀中,用抗蚀膜来实现对激光腐蚀区域的控制。理论分析和实验结果都表明,抗蚀膜掩蔽法可以有效地控制激光化学腐蚀的图像形状;因不需要对激光光束进行聚焦,光传播垂直于基片表面,制作出的腐蚀孔侧壁可以具有很高的垂直度;利用激光光束中心区域能量分布近似均匀的特点,使小面积腐蚀区域的腐蚀速率近似相等,腐蚀面内各点没有明显的高度差。因为以上优点,抗蚀膜掩蔽法能克服现有激光腐蚀方法的诸多弊端,简化激光腐蚀工艺,在特殊结构光电器件和光电集成中具有广泛的应用前景。
A new method of laser-induced liquid phase etching is proposed, which is the resist film masking method. Resist film masking method refers to the laser etching, the use of a resist film to achieve the control of the laser corrosion area. Theoretical analysis and experimental results show that the resist masking method can effectively control the image shape of laser chemical etching. Since the laser beam does not need to be focused and the light propagates perpendicularly to the surface of the substrate, the prepared etching hole sidewall can have High verticality. By using the characteristic of uniform energy distribution in the central region of the laser beam, the corrosion rate in the small area corrosion area is approximately equal, and there is no obvious height difference at each point in the corrosion surface. Because of the above advantages, the resist film masking method can overcome the disadvantages of the existing laser etching methods, simplify the laser etching process, and has broad application prospect in the special structure photoelectric devices and optoelectronic integration.