用对向靶反应溅射法制备了铁氮薄膜,用 X 射线衍射和透射电镜分析了其晶体结构,并研究了反应气压和基板偏压对晶体结构的影响。在0～8×10~(-3)Torr 反应气压范围内制出了α-Fe,α″-Fe_(16)N_2,γ~1-Fe_4N,ε~1-Fe_3NFe_2N,ε-Fe_3N 和ξ~1-Fe_2N 取向多晶以及非晶 FeN 各相,在各相中均有不同程度的晶格畸变。 The ferroelectric thin films were prepared by the counter-reactive sputtering. The crystal structures of the films were characterized by X-ray diffraction and transmission electron microscopy. The effects of reaction pressure and substrate bias on the crystal structure were also investigated. Α-Fe, α "-Fe_ (16) N_2, γ ~ 1-Fe_4N, ε ~ 1-Fe_3NFe_2N, ε-Fe_3N and ξ ~ Fe_3N were obtained in the pressure range of 0 ~ 8 × 10 ~ 1-Fe 2 N-oriented polycrystalline and amorphous FeN phases have different degrees of lattice distortion in each phase.