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多弧离子镀设备蒸发源的电弧放电受外加磁场的严格控制，靶面处不同的磁场分布 具有不同的电弧放电形貌，这样，靶面处磁场强度的计算显得特别重要。本文基于多年 科研实践和研究生论文试验对电磁线圈在靶面各处产生的磁场强度的计算进行了理论推 导和研究，建立了数学模型，并进行了比较精确的磁场计算。计算值与实测值较好地相 吻合。该计算可作为多弧靶设计的依据。
Multi-arc ion plating equipment evaporation source arc discharge under the strict control of the applied magnetic field, different magnetic field distribution at the target surface with different arc discharge morphology, so that the magnetic field intensity at the target surface is particularly important. Based on many years of scientific research and postgraduate thesis experiments, this paper theoretically deduces and studies the calculation of the magnetic field intensity generated by the electromagnetic coil around the target surface. The mathematical model is established and the magnetic field calculation is carried out more accurately. The calculated value is in good agreement with the measured value. This calculation can be used as the basis for multi-arc target design.