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基于双电源电压和双阈值电压技术,提出了一种优化全局互连性能的新方法.文中首先定义了一个包含互连延时、带宽和功耗等因素的品质因子用以描述全局互连特性,然后在给定延时牺牲的前提下,通过最大化品质因子求得优化的双电压数值用以节省功耗.仿真结果显示,在65nm工艺下,针对5%,10%和20%的允许牺牲延时,所提方法相较于单电压方法可分别获得27.8%,40.3%和56.9%的功耗节省.同时发现,随着工艺进步,功耗节省更加明显.该方法可用于高性能全局互连的优化和设计.
Based on dual supply voltage and dual threshold voltage technique, a new method to optimize global interconnect performance is proposed.Firstly, a quality factor including interconnect delay, bandwidth and power consumption is defined to describe the global interconnect characteristics , And then optimize the voltage value by maximizing the quality factor to save power given the time delay sacrifice.The simulation results show that at the 65nm process, for 5%, 10% and 20% of the allowable Compared with the single-voltage method, the proposed method can achieve the power saving of 27.8%, 40.3% and 56.9% respectively, and the power saving is more obvious as the process progresses. This method can be used for high-performance global Optimization and design of interconnects.