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4763602 Thin film deposition apparatus including a vacuum transport mechanism 具有真空传送机构的薄膜沉积装置 Arun Madan 在基片上沉积薄膜的装置至少包括一套沉积组件、一套负载联锁组件、一个门阀和一套传送机构。传送机构使基片在负载联锁和沉积组件之间移动,因此应适合在超高真空条件下工作。沉积组件保持超高真空,利用组件中所包含的反应气体把沉积材料沉积到基片上。负载联锁组件通过门阀接到沉积组件上,也要求保持超高真空。传送装
4763602 Thin Film Deposition Apparatus With Vacuum Transfer Mechanism Arun Madan The apparatus for depositing a thin film on a substrate includes at least one deposition assembly, a load lock assembly, a gate valve, and a set of transfer mechanisms. The transport mechanism moves the substrate between the load lock and the deposition assembly and should therefore be suitable for operation under ultra-high vacuum conditions. The deposition assembly maintains an ultra-high vacuum and the deposition material is deposited onto the substrate using the reaction gas contained in the assembly. The load lock assembly is attached to the deposition assembly through the gate valve and also requires maintenance of ultra-high vacuum. Transport equipment