论文部分内容阅读
采用中频非平衡磁控溅射法沉积了含氢无定形碳(a-C:H)薄膜,利用球-盘摩擦试验机考察了不同载荷下薄膜在高真空中(5.0×10-3Pa)的摩擦磨损行为,通过对磨损表面的分析以及相关的验证实验,探讨了应力(接触应力、薄膜内应力)对薄膜在高真空中摩擦磨损行为的影响.结果表明:在高真空中,随着载荷的增加,薄膜的摩擦系数逐渐降低,而耐磨寿命却急剧缩短;在高真空高接触应力下,无论是摩擦还是静压,薄膜表面均出现了明显的应力释放花样.因此可以认为,薄膜在高真空中的磨损失效与其在高接触应力下的内应力释放有密切关系.
Hydrogen-containing amorphous carbon (aC: H) films were deposited by IF unbalance magnetron sputtering. The friction and wear of the film under high load (5.0 × 10-3Pa) were investigated by ball-disk friction tester The influence of stress (contact stress and internal film stress) on the friction and wear behavior of the film in high vacuum was investigated by analyzing the wear surface and the related verification experiments. The results show that under high vacuum, with the increase of load , The friction coefficient of the film gradually decreases, but the wear life is drastically shortened. Under the conditions of high vacuum and high contact stress, both the friction and the static pressure show obvious stress relief patterns on the film surface. Therefore, The wear failure is related to its release of internal stress under high contact stress.