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为了获得光学性质均匀的大面积软X射线多层膜,必须控制好周期结构中单层膜的厚度均匀性。为此建立了磁控溅射薄膜沉积技术中单层膜厚度均匀性的分析和控制模型,解释了基底变速转动法可用来获得膜厚均匀的多层膜,并根据理论分析获得了基底的变速路径。将其应用于基底公转速度变速法来制备均匀性可控的大面积Mo/Si软X射线多层膜。小角X射线衍射测试结果表明,采用优化后的变速路径制备的多层膜,样品不同位置的各级次衍射峰位都能很好吻合,说明多层膜的周期厚度基本一致。计算表明该方法在直径200mm范围内可将周期结构中Mo层的不均匀性从20.6%修正到1.1%,Si层的不均匀性从27.0%修正到1.6%。
In order to obtain a large area soft X-ray multilayer film with uniform optical properties, it is necessary to control the thickness uniformity of the single-layer film in the periodic structure. For this reason, the analysis and control model of single-layer film thickness uniformity in magnetron sputtering thin film deposition technology is established. It is explained that the substrate variable speed rotation method can be used to obtain a multi-layer film with uniform film thickness. Based on the theoretical analysis, path. This method was applied to the speed change method of substrate revolution to fabricate a large area Mo / Si soft X-ray multilayer film with uniform control. The results of small-angle X-ray diffraction test show that the multi-layer films prepared by the optimized transmission path can be well fitted at different positions of the sample, indicating that the multilayer films have the same thickness. The calculation shows that the method can correct the non-uniformity of Mo layer in periodic structure from 20.6% to 1.1% and the Si layer inhomogeneity from 27.0% to 1.6% within the diameter of 200mm.