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于钝铜片及玻碳上采用双电解池恒电位结晶制取了［Ｃｏ（０．５ｎｍ～２．２ｎｍ）／Ｐｔ（２．０ｎｍ）］ｎ（ｎ≥４０）金属多层膜．低角度Ｘ射线衍射表明多层膜有良好的周期性调制结构，其Ｂｒａｇｇ峰的半幅值随着钴层电结晶电位的负移和铂层电结晶电位正移而减小．中角度Ｘ射线衍射表明界面上存在ＣｏＰｔ３金属化合物．多层膜的磁滞回线表明该多层膜的易磁化轴平行于膜面，表现出平面磁各向异性．以低过电位镀Ｃｏ（厚度约０．５ｎｍ）的多层膜的垂直方向磁滞回线形状较好，有望表现出垂直磁各向异性．
The [Co (0.5nm ~ 2.2nm) / Pt (2.0nm)] n (n≥40) metal multilayers were prepared on the passive copper plate and the glassy carbon by the potentiostatic crystallization of the dual cell. Low-angle X-ray diffraction shows that the multilayer films have a good periodic modulation structure, and the half amplitude of the Bragg peak decreases with the negative shift of the electric potential of the cobalt layer and the positive shift of the electric potential of the platinum layer. Mid-angle X-ray diffraction showed the presence of CoPt3 metal compounds at the interface. The hysteresis loops of the multilayer films indicate that the easy axis of magnetization of the multilayer films is parallel to the film surface, exhibiting planar magnetic anisotropy. The multilayered film coated with Co at a lower overpotential (with a thickness of about 0.5 nm) has a good vertical hysteresis loop shape and is expected to exhibit perpendicular magnetic anisotropy.