提出一种测量小剂量离子注入样品均匀性的新方法——多探针Ｃ－Ｖ法．研制了相关的硬件和软件．此方法基于以下２个新颖的思想：１）采用多根探针测量，由微机通过开关矩阵进行控制，自动轮流切换，大大提高了速度、效率和可靠性．２）采用深浅不同的彩色地图（ＭＡＰ）来表示大硅片上各测量点的注入剂量，从而形象直观地显示出离子注入的均匀性，既容易理解，又容易记忆．通过对双注入ＭＯＳ样品上的８×８测试点阵列进行的测量分析证明：此系统及此新方法可用于离子注入工艺的在线监测 A new method of multi-probe C-V method is proposed to measure the homogeneity of small dose ion-implanted samples. Developed the relevant hardware and software. This method is based on the following two novel ideas: 1) Using multiple probes to measure, controlled by a switch matrix through a microcomputer, automatic rotation switching greatly improves speed, efficiency and reliability. 2) using different depth of color map (MAP) to represent the large wafer on the measurement point of the injection dose, which visually shows the uniformity of ion implantation, both easy to understand, but also easy to remember. The measurement and analysis of the array of 8 × 8 test points on double injection MOS samples demonstrate that the system and the new method can be used for on-line monitoring of ion implantation process