论文部分内容阅读
采用真空磁过滤电弧离子镀方法 ,在GT35基体上沉积类金刚石膜。通过对清洗工艺及弧电流、工件所加负偏压、沉积温度等参数的研究 ,制定出了合理的工艺路线 ,并对这种膜层进行了X—射线光电子谱 (XPS)分析 ,利用干涉仪、纳米硬度计对膜层的粗糙度、纳米硬度作了进一步检测。结果表明 ,采用此种方法制备的类金刚石膜层 ,SP3含量约为 4 0 .1% ;组织致密 ,无大的颗粒 ;镀膜后的粗糙度可以达到 0 .0 15μm ;纳米硬度约为 5 5GPa。并将膜层与TiN膜层组成摩擦副 ,进行了耐磨性试验 ,结果表明膜层的耐磨性较好。
Using vacuum magnetic filtration arc ion plating method, a diamond-like carbon film is deposited on a GT35 substrate. Through the study of the cleaning process and arc current, the negative bias applied to the workpiece, the deposition temperature and other parameters to develop a reasonable process route, and the X-ray photoelectron spectroscopy (XPS) analysis of the film, the use of interference Instrument, nano-hardness of the film roughness, nano-hardness for further testing. The results show that the DLC film prepared by this method possesses an SP3 content of about 40.1%, a dense structure with no large particles, a roughness of 0.015μm after coating and a nano-hardness of about 55GPa . And the film and TiN film friction pair, the wear resistance test, the results show that the film wear resistance is better.