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以离子注入工艺为例 ,通过研究沟道效应对离子注入工艺的影响 ,提出了建立设备模型的必要性 ,并进行了离子注入设备模型的初步研究
Taking the ion implantation process as an example, the necessity of establishing a device model is proposed by studying the influence of channel effect on the ion implantation process, and a preliminary study on the ion implantation device model