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在室温下采用气相法对碱性SiO_2减反薄膜进行后处理,获得了疏水性能、激光损伤阈值均高于未经后处理的薄膜,其抗有机污染的性能明显优于普通的SiO_2减反薄膜。研究了气相硅烷化处理对薄膜在使用或储存环境下可能存在的有机污染物的抗性,并分析其机理。实验发现,经过后处理薄膜的抗污染性能与氨气氛处理时间的长短有直接关系。氨气氛处理时间少于24 h的薄膜相比于木经后处理的薄膜抗污染性能没有明显变化,而氨气氛处理时间超过72 h的薄膜其抗污染性能明显高于未经处理的薄膜。经氨气氛处理72 h后,再经六甲基二硅胺烷结合及热处理方式后处理的薄膜表现出对有机硅烷良好的抗污染性能,经正己烷饱和蒸气污染98 h后,样品的透射率没有发生明显改变。并且,处理后薄膜的激光损伤阈值也明显高于未处理薄膜。
At room temperature, the basic SiO 2 anti-reflection film was treated by gas-phase method to get the hydrophobic property. The damage threshold of the SiO 2 film was higher than that of the non-aftertreatment film. The anti-organic pollution was better than the ordinary SiO 2 anti-reflection film . The resistance of vapor-phase silylation to organic contaminants that may exist in the environment of use or storage was studied and its mechanism was analyzed. The experiment found that the post-treatment film anti-pollution performance and ammonia atmosphere has a direct relationship between the length of treatment. The antifouling performance of films treated with ammonia atmosphere for less than 24 h did not change significantly compared with wood treated films, while the antifouling performance of films treated with ammonia atmosphere for more than 72 h was significantly higher than that of untreated films. After 72 h of ammonia treatment, the films treated with hexamethyldisilazane and heat treatment showed good antifouling property to organosilane. After being contaminated by n-hexane saturated vapor for 98 h, the transmittance No significant changes have taken place. Moreover, the laser damage threshold of the treated film is also significantly higher than that of the untreated film.