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干涉测量是众多科学与工程领域广泛采用的精密计量手段。探索了一种方便可控的基于双光栅衍射的叠栅干涉相敏测角方法,可直接用于接近式光刻过程中掩模衬底的倾斜矫正及面内角调节,便于微纳米器件及微光电子系统集成等相关应用。本方法旨在分别利用双光栅多次衍射产生的对称与相似级次,实现(m,-m)级叠栅干涉与(m,0)级叠栅干涉,产生相位与二者相对倾斜角、面内角有关的场分布。分析推导了叠栅干涉测角的基本原理,然后介绍相应的(m,-m)级与(m,0)级干涉测角方案设计。具体而言,二者均类似地根据条纹偏转及频率变化分别以离轴与同轴的方式监测倾斜及面内偏转角度。设计相应的组合光栅标记进行实验验证。实验结果及分析表明,倾斜角与面内角的调节精度分别可达10-3 rad及10-4 rad。
Interferometry is a sophisticated measurement tool widely used in many fields of science and engineering. A convenient and controllable dipole interferometry phase angle measurement method based on double grating diffraction can be directly applied to tilt correction and in-plane angle adjustment of mask substrate in proximity lithography, which is convenient for micro-nano devices and micro-nano devices Optoelectronic system integration and other related applications. The method aims to utilize the symmetry and similar orders of multiple diffraction of the double grating respectively to realize (m, -m) stacked grating interference and (m, 0) stacked grating interference to generate the phase and the relative inclination therebetween, Field angle related field distribution. Analyze and deduce the basic principle of overlap angle measurement, and then introduce the corresponding (m, -m) and (m, 0) -order interferometry angle design. Specifically, both similarly monitor tilt and in-plane deflection angles off-axis and co-axially, respectively, based on fringe deflection and frequency variation, respectively. Design the corresponding combination of grating markers for experimental verification. Experimental results and analysis show that the adjustment accuracy of tilt angle and in-plane angle can reach 10-3 rad and 10-4 rad, respectively.