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JEOL JBX- 5 0 0 0 L S是矢量扫描的电子束曝光机 .系统采用 L a B6 灯丝 ,可以工作在 2 5 k V和 5 0 k V的加速电压下 .对该系统的分辨率、稳定性、场拼接和套刻精度进行了系列研究 ,得到了分辨率为 30 nm的图形 ,图形的套刻精度也优于 4 0 nm.
The JEOL JBX-500L is a vector-scanned electron beam lithography system that uses L a B6 filaments and operates at accelerating voltages of 25 kV and 50 k V. The resolution, stability , Field splicing and overlay accuracy of a series of studies have been obtained with a resolution of 30 nm graphics, graphics, overlay accuracy is better than 40 nm.