制备了高性能铜系层状金属,并基于数学模型分析了纳米尺度下该金属的强化能力。结果表明,改变H-P公式中的K值可以提高位错导致滑移的临界切应力值τ*,从而改变金属的组元层和界面层,提高金属的强度。对于纳米尺度下的高性能铜系层状金属,可以采用改变组元层单层厚度的方法来提高材料的极值强度。 A high-performance copper-based layered metal was prepared and the strengthening ability of the metal at the nanoscale was analyzed based on a mathematical model. The results show that changing the value of K in H-P formula can increase the critical shear stress τ * of slip caused by dislocation, so as to change the elemental and interfacial layers and improve the strength of metal. For nano-scale high-performance copper-based layered metal, you can use the method of changing the thickness of the single component layer to enhance the material’s extreme strength.