众所周知,光刻是制作半导体集成电路的一项关键性技术,由于集成电路朝着高集成度的方向发展,许多国家都竞相致力于发展高分辨率、高生产率和低成本的制作半导体集成电路的光刻技术。扫描电子束曝光,由于其具有高分辨率和能灵活进行控制的优点,逐渐地代替了常规的光学曝光方法,成为目前国际上发展大规模和超大规模集成电路最核心的技术之一。扫描电 As we all know, lithography is a key technology in the manufacture of semiconductor integrated circuits. As integrated circuits are becoming more and more integrated, many countries are racing to develop high-resolution, high-productivity and low-cost semiconductor integrated circuits Lithography. Due to its high resolution and flexible control, scanning electron beam exposure has gradually replaced conventional optical exposure methods and has become one of the core technologies in the development of large-scale and very large-scale integrated circuits in the world at present. Scanning electricity