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介绍了组合刻蚀法制备窄带滤光片列阵的基本原理和制备工艺,这是一种效率非常高的制备方法,只需N次刻蚀就可以完成2N通道窄带滤光片列阵的制备,而且可以用于制备不同波段窄带滤光片列阵。展示了可见-近红外波段32通道窄带滤光片列阵和中红外波段16通道窄带滤光片列阵的实验结果,其中32通道窄带滤光片列阵的带通峰位基本呈线性分布在774.7~814.2 nm之间,所有滤光片的半峰全宽都非常窄(δλ<1.5 nm),相应于δλ/λ<0.2%,半峰全宽最窄的滤光片达到0.8 nm,相应于δλ/λ<0.1%,其带通峰位λ=794.3 nm;各通道的带通透过率在21.2%~32.4%之间,大部分在30%左右。
The basic principle and preparation process of the narrow-band filter array fabricated by the combined etching method are introduced, which is a very efficient preparation method. The preparation of a 2N channel narrow-band filter array can be completed by only N times of etching , But also can be used to prepare different band narrowband filter array. The experimental results of the visible-near-infrared 32-channel narrowband filter array and the mid-infrared 16-channel narrowband filter array are shown. The bandpass peak of the 32-channel narrowband filter array is basically linear The full width at half maximum of all filters is very narrow (δλ <1.5 nm) between 774.7 and 814.2 nm, corresponding to δλ / λ <0.2%. The filter with the narrowest full width at half maximum reaches 0.8 nm. At δλ / λ <0.1%, the bandpass peak λ = 794.3 nm. The bandpass transmittance of each channel is between 21.2% and 32.4%, mostly about 30%.