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采用多靶反应磁控溅射技术制备了一系列不同Si含量的Ti-Al-Si-N复合膜。采用能谱仪、X射线衍射仪、三维轮廓仪、原子力显微镜和显微硬度仪对薄膜进行表征,研究了Si含量对Ti-Al-Si-N复合膜微结构和力学性能的影响。结果表明:用Ti0.33 Al0.67合金靶制备的Ti-Al-N复合膜呈双相共存结构(fcc+hcp),Si的加入,促进了六方相的生长,细化了晶粒,降低了表面粗糙度。随着Si含量的增加,Ti-Al-Si-N复合膜的硬度逐渐增大,在Si含量为16.69 at%时,达到最大硬度32.3 GPa,继续增加Si含量,薄膜硬度降低。
A series of Ti-Al-Si-N composite films with different Si contents were prepared by multi-target reactive magnetron sputtering. The effects of Si content on the microstructure and mechanical properties of Ti-Al-Si-N composite films were investigated by energy dispersive spectroscopy, X-ray diffraction, three-dimensional profiler, atomic force microscopy and microhardness tester. The results show that the addition of fcc + hcp and Si to the Ti-Al-N composite film prepared by Ti0.33 Al0.67 alloy can promote the growth of the hexagonal phase, refine the grains and reduce Surface roughness. With the increase of Si content, the hardness of Ti-Al-Si-N composite films gradually increases. When the Si content reaches 16.69 at%, the maximum hardness reaches 32.3 GPa, and the Si content continues to increase, and the hardness of the films decreases.