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利用脉冲偏压磁过滤电弧离子沉积技术在不同负偏压下制备了(Ti,Al)N薄膜,通过扫描电子显微镜、XP-2台阶仪、纳米压痕仪和X射线衍射仪分别测试分析了脉冲偏压与磁过滤共同的作用对薄膜的微观结构、成份、薄膜厚度、显微硬度和晶体结构的影响规律。实验结果表明,在基体上施加脉冲偏压和在电弧蒸发源上使用磁过滤技术,可改善所制备薄膜的组织结构、提高其综合力学性能。通过对在不同负偏压下所制备的样品的综合力学性能的测试分析可得出:在负偏压为200V时制备的样品综合力学性能最好。
(Ti, Al) N thin films were prepared by pulsed bias magnetic filtration arc ion deposition at different negative bias voltages. The films were characterized by scanning electron microscopy, XP-2 step analyzer, nanoindenter and X-ray diffractometer The influences of pulse bias and magnetic filtration on the microstructure, composition, film thickness, microhardness and crystal structure of the films were studied. The experimental results show that applying pulsed bias on the substrate and using magnetic filtration technology on the arc evaporation source can improve the microstructure and improve the mechanical properties of the prepared films. Through the analysis of the comprehensive mechanical properties of the prepared samples under different negative bias voltages, it can be concluded that the prepared samples have the best mechanical properties at a negative bias voltage of 200V.