等离子体工艺在半导体技术中是一种新的工艺,在半导体物理及半导体器件的研究与制造中,越来越显示其重要性,在LSI和VLSI的科研与生产中,无论是等离子体淀积各种薄膜还是干法腐蚀,都已成为必不可少的手段。因此,在高等院校有关半导体专业的教学中,应当包括 The plasma process is a new process in semiconductor technology and has become more and more important in the research and manufacture of semiconductor physics and semiconductor devices. In the research and production of LSI and VLSI, both the plasma deposition Various films or dry etching, have become an indispensable means. Therefore, the teaching of semiconductor specialty in colleges and universities should include