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针对真空磁控溅射射频电源阻抗匹配问题,设计射频L型阻抗匹配网络结构。在负载阻抗不同速率变化时,基于遗传算法优化反射系数指标,通过调节匹配网络中两个电容值以达到与射频源的阻抗匹配。大量仿真结果表明,遗传算法的阻抗匹配过程,反射系数能够很快地被调节到最佳值;即使负载阻抗产生较大突变,匹配网络亦能使反射系数快速恢复到最佳匹配点。匹配过程速度快、在最佳匹配点处反射系数波动小、匹配系统精度高。
Aiming at the impedance matching problem of vacuum magnetron sputtering RF power supply, a radio frequency L-type impedance matching network structure is designed. When the load impedance varies at different rates, the reflectance index is optimized based on genetic algorithm and the impedance matching with the RF source is achieved by adjusting two capacitance values in the matching network. A large number of simulation results show that the genetic algorithm impedance matching process, the reflection coefficient can be quickly adjusted to the optimal value; even if the load impedance of a large mutation, the matching network can make the reflection coefficient quickly restored to the best matching point. The matching process is fast, the reflection coefficient fluctuates little at the best matching point, and the matching system has high precision.