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利用电化学测量方法测量纯镍在3.5%NaC l溶液中,静水压力为0 MPa和8 MPa条件下的点蚀击破电位和孕育时间.分析得到纯镍在不同静水压力下点蚀击破电位的理论精确值,利用随机分析方法分析纯镍在静水压力下的点蚀机制.实验结果表明静水压力对纯镍的点蚀过程有着重要的影响,在静水压力下纯镍的点蚀行为和机制发生了改变.在较高的静水压力下,纯镍点蚀产生的敏感性增强,点蚀击破电位Ecritical明显降低;纯镍点蚀诱导时间也变短,其点蚀产生的机制发生了改变;在较高静水压力下,纯镍表面的钝化膜活性增强,恶化了纯镍的耐蚀能力.
The pitting rupture potential and incubation time of pure nickel in 3.5% NaC l solution at 0 MPa and 8 MPa hydrostatic pressure were measured by electrochemical measurement method.The theory of pitting rupture potential of pure nickel under different hydrostatic pressure was obtained And the pitting corrosion mechanism of pure nickel under hydrostatic pressure was analyzed by means of stochastic analysis.The experimental results showed that the hydrostatic pressure had an important influence on the pitting corrosion of pure nickel and the pitting corrosion behavior and mechanism of pure nickel under hydrostatic pressure At high hydrostatic pressure, the sensitivity of pure nickel pitting increased, the pitting corrosion potential Ecritical significantly reduced; pure nickel pitting induction time also shortened, and its pitting mechanism has changed; in the more High hydrostatic pressure, pure nickel surface passivation film activity increased, deteriorating the corrosion resistance of pure nickel.