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The lanthanum(III)complex[Li(thf)3(m-Cl)La{N(SiMe3)2}3](3)was obtained by the reaction of LaCl3 with three equiv of Li[N(SiMe3)2]3in a tetrahydrofuran solution.The molecular structure of 3 in the solid state was characterized by a tetracoordinated anionic lanthanide(III)amide in form of an adduct with LiCl(thf)3 as evidenced by single crystal X-ray structure analysis.In order to study the suitability of 3 as a precursor for the deposition of La2O3/LiLaSiO4 by thin layer deposition techniques,its thermal behavior was investigated by thermogravimetry(TG)and TG-MS-coupled studies.TG studies show a two-step decomposition process,whereby volatile decomposition products can be detected during the second decomposition step.TG measurements under an atmosphere of oxygen produced La2O3.Calcination processes of 3 under ambient atmosphere for 10 h at 1000℃ gave La2O3 and LiLaSiO4,which was confirmed by PXRD studies.Metal-organic 3 was applied as spin-coating precursor for La2O3 thin film formation giving the as-deposited layers nearly crack-free.