本书第二版在第一版的基础上进行了修订,并在内容上有所增加。近几年来,薄膜物理学和薄膜技术的发展令人瞩目,本书力图阐述这些发展中最重要的特征。目前,在淀积方法中最令人注目的是离子加速法和分子束外延。本书导言中介绍了电子束淀积,离子束淀积和激光淀积。对于较先进的薄膜诊断方法以及成膜和薄膜物理特性补充了新的见解。其内容致力于应用,力图使读者把注意 The second edition of this book was revised on the basis of the first edition, and the content has been increased. In recent years, the development of thin-film physics and thin-film technology is remarkable, and the book seeks to address the most important features of these developments. At present, the most remarkable of the deposition methods are ion acceleration and molecular beam epitaxy. Introduction to the book describes electron beam deposition, ion beam deposition and laser deposition. Newer insights are added to the more advanced methods of thin film diagnostics as well as film and film physics. Its content is devoted to applying, trying hard to make the reader pay attention