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1.引言 粒子束应用装置不仅在半导体制造工艺上是不可缺少的,而且对各种物质的表面改性和薄膜形成也起作用。人们正在期待着其应用面的扩大。 本文作为这个应用而扩大的一个环节而开发的IVD装置是通过并用离子照射和真空蒸镀能在基板表面形成化合物薄膜(新材料)的装置。象这样
1. INTRODUCTION Particle beam applications are indispensable not only in the semiconductor manufacturing process, but also in the surface modification and film formation of various substances. People are looking forward to the expansion of its application. The IVD device developed as an extension of this application is a device that can form a thin film of a compound (new material) on the surface of a substrate by ion irradiation and vacuum evaporation. Like this