Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency

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Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon(6 slm) and a small amount of acetone(0-2100 ppm). Plasma composition was measured by optical emission spectroscopy(OES). In addition to a large number of Ar spectra lines, we observed some spectra of C, CN, CH and C2. Through changing acetone content mixed in argon, we found that the optimum discharge condition for deposition can be characterized by the maximum concentration of carbonaceous species. The deposited film was characterized by scanning electron microscopy(SEM) and X-ray photoelectron spectroscopy(XPS) and Fourier transform infrared(FTIR) spectroscopy. The XPS indicated that the film was mostly composed of C with trace amount of O and N elements. The FTIR suggested di?erent carbon-containing bonds(-CHx, C=O, C=C, C-O-C) presented in the deposited film. Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon (6 slm) and a small amount of acetone (0-2100 ppm) In addition to a large number of Ar spectra lines, we observed some spectra of C, CN, CH and C2. Through changing acetone content mixed in argon, we found that optimum The deposition condition for deposition can be characterized by the maximum concentration of carbonaceous species. The deposited film was characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy. The XPS indicates that the The film was mostly composed of C with trace amount of O and N elements. The FTIR suggested di? erent carbon-containing bonds (-CHx, C = O, C = C, COC) presented in the deposited film.
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