报道了 Φ15 0 m m CMOS硅外延材料的研究开发及集成电路应用成果 ,对 Φ2 0 0 mm P/P-硅外延材料进行了初步探索研究 .Φ15 0 m m P/P+硅外延片实现了批量生产 ,并成功应用于集成电路生产线 ,芯片成品率大于 80 % .硅外延片的参数指标能满足集成电路制造要求 This paper reports the research and development of Φ15 0 mm CMOS silicon epitaxial materials and the application results of integrated circuits, and initially explores the Φ200mm P / P-Si epitaxial materials.The Φ15 0 mm P / P + Si epitaxial wafer realizes mass production, And successfully applied to the IC production line, the chip yield greater than 80% .Silicon epitaxial wafers parameters to meet the requirements of integrated circuit manufacturing