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用电子束蒸发法制备出ZrO2/SiO2和YSZ/SiO2多层膜,分别测定了薄膜结构特性和激光损伤阈值.实验结果表明:Y2O3稳定的ZrO2镀膜材料在电子束蒸发过程中不会发生相变,而未稳定的ZrO2则必然发生相变产生喷溅,使缺陷增加,从而使损伤阈值降低.通过分析认为相变引起的缺陷是YSZ/SiO2和ZrO2/SiO2高反膜损伤阈值差别的主要原因.
The ZrO2 / SiO2 and YSZ / SiO2 multilayer films were prepared by electron beam evaporation method, respectively, the film structure characteristics and laser damage threshold were measured.The experimental results show that the Y2O3-stabilized ZrO2 coating material does not change phase during electron beam evaporation , While the unstable ZrO2 will inevitably undergo phase change to produce splash, which will increase the defects and reduce the damage threshold.Through the analysis, it is considered that the defects caused by phase transformation are the main reason for the difference of the damage threshold of YSZ / SiO2 and ZrO2 / SiO2 high- .