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采用不同的二次冷轧压下率分别制备了0.27、0.23和0.20 mm的CGO硅钢,利用X射线衍射仪(XRD)和电子背散射衍射技术(EBSD)对3种不同厚度试样的初次再结晶织构组分含量和分布状态进行了对比研究。结果表明,经过不同二次冷轧压下率,试样中初次再结晶基体的织构类型相同,以γ织构和α取向线上{112}<110>至{111}<110>区间的织构为主,二次冷轧压下率越大,初次再结晶基体中Goss晶粒的含量越多,位向更准确,{111}<110>和{111}<112>等有利织构的含量也越多,有利于增强二次再结晶后Goss织构的锋锐程度,并使成品的磁性能得到提高。
The 0.27, 0.23 and 0.20 mm CGO silicon steels were prepared by different secondary cold rolling reduction rates. The surface morphology of the CGO silicon steel was characterized by X-ray diffraction (XRD) and electron backscatter diffraction (EBSD) The content and distribution of crystalline texture components were compared. The results show that the primary recrystallized matrix has the same type of texture after different secondary cold rolling reduction rates. The γ texture and the {112} <110> to {111} <110> Texture, the secondary cold rolling reduction rate is greater, the initial recrystallization matrix Goss grain content, more accurate orientation, {111} <110> and {111} <112> and other favorable texture The more the content is, will help enhance the sharpness of the Goss texture after secondary recrystallization, and improve the magnetic properties of the finished product.