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利用化学还原法制备了Ni纳米线,通过扫描电子显微镜(SEM)研究了制备参数(磁场强度、Ni 2+离子浓度和反应温度)对Ni纳米线合成以及结构的影响。实验结果表明:磁场强度是影响Ni纳米线直径均匀性的关键因素。无外加磁场时所制得的产物为Ni纳米颗粒;当磁场强度达到0.25 T时,纳米线的长度较长,直径较均匀。Ni 2+离子浓度决定着纳米线直径的大小。Ni 2+浓度越低,直径越小。反应温度影响成核以及纳米线的表面形貌。当温度低于50℃时,溶液中没有纳米线生成,说明溶液没有反应;当反应温度在60~80℃范围内时,纳米线的表面均有明显的刺状结构;当温度高于85℃时,纳米线表面的刺状结构数目明显减少,形成了光滑的表面。
Ni nanowires were prepared by chemical reduction method. The effects of preparation parameters (magnetic field strength, Ni 2+ ion concentration and reaction temperature) on the synthesis and structure of Ni nanowires were investigated by scanning electron microscopy (SEM). The experimental results show that the magnetic field intensity is the key factor affecting the uniformity of Ni nanowire diameter. When the magnetic field is 0.25 T, the nanowire length is longer and the diameter is more uniform. The concentration of Ni 2+ ion determines the size of nanowire diameter. The lower the concentration of Ni 2+, the smaller the diameter. The reaction temperature affects the nucleation and the surface morphology of the nanowires. When the temperature is below 50 ℃, there is no nanowires in the solution, indicating that the solution does not react. When the reaction temperature is in the range of 60 ~ 80 ℃, the surface of the nanowires have obvious thorn structures. When the temperature is higher than 85 ℃ , The number of spine-like structures on the surface of the nanowires is significantly reduced, forming a smooth surface.