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光刻机是大规模集成电路生产中的关键设备,光刻过程中能否快速、精确地对准是光刻机主要性能之一。随着集成电路集成度的提高,光刻线条也愈来愈细。因此,对光刻机的对准精度要求也就越来越高。 笔者多年来一直从事半导体设备维修工作,从中观察和体会到,要想进一步提高光刻的成品率和生产效率,快速准确对准是非常重要的,而预对准的精度则是保证快速对准的前提。我们公司八六年初从日本Canon公司引进的PLA—501F光刻机,至今性能一直很稳定,使用情况良好。但是在维护和
Lithography machine is the key equipment in the production of large-scale integrated circuits, lithography process can quickly and accurately aligned lithography machine is one of the main performance. With the improvement of integrated circuit integration, lithography lines are getting smaller and smaller. Therefore, the lithography machine alignment accuracy requirements are getting higher and higher. The author has been engaged in semiconductor equipment maintenance work over the years, from which to observe and understand that in order to further improve the lithography yield and production efficiency, rapid and accurate alignment is very important, and the accuracy of pre-alignment is to ensure rapid alignment The premise. Our company introduced the PLA-501F lithography machine from Japan Canon Company in early 1986, and its performance has been stable and in good condition till now. But in the maintenance and