一、引言 离子源是离子注入机的关键部件。注入机如能配备一个较理想的离子源,就可以得到品质较好,数值较大的束流以及不同种类的离子。 由于冷阴极潘宁离子源具有功耗小、寿命长、结构紧凑、体积小、电源简单、束流调节方便等特点。所以被广泛应用在离子注入机上。尤其作为半导体器件注入工艺用的离子注入机大多采用冷阴极潘宁离子源。 I. INTRODUCTION Ion source is the key component of ion implanter. If the injection machine can be equipped with a more ideal ion source, you can get better quality, larger values ​​of the beam and different types of ions. As the cold cathode Penning ion source has the advantages of small power consumption, long life, compact structure, small size, simple power supply, convenient beam adjustment and so on. So it is widely used in ion implanter. In particular, as a semiconductor device implantation process used in ion implanters are mostly cold cathode Penning ion source.