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本文制备了六种不同结构的 α-Si:H 多层膜结构,对其切面进行了扫描电镜观察分析.结果表明:辉光法生长 α-Si:H 膜过程中存在沉积和刻蚀一对对抗性矛盾,在常规工艺下各层界面不明显存在,在特殊条件下,可能生长出尺度不同的微晶镶嵌在非晶网络中。
In this paper, six kinds of α-Si: H multilayer films with different structures were fabricated and their sections were observed by scanning electron microscopy. The results show that there is a pair of deposition and etching in the α-Si: H film grown by glow- Contradictory confrontation, the interface of each layer does not obviously exist under the conventional technology, under special conditions, different sizes of microcrystals may be grown in the amorphous network.