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用于离子束辅助轰击镀膜的考夫曼型变孔径球面栅离子源，由于缩小了体积，散热条件不好，离子源启动后温度迅速上升，陶瓷绝缘子的绝缘强度迅速降低，永久磁铁的磁场强度也下降，致使离子源的连续有效工作时间不足半小时。采用多处屏蔽后，延长了陶瓷绝缘子和磁棒处于较低工作温度的时间，使离子源的连续有效工作时间达到了一小时，基本满足了辅助轰击镀膜的要求。
The Kaufman-type variable aperture spherical grid ion source for ion beam assisted bombardment coating has the advantages of reduced volume, poor heat dissipation condition, rapid rise of temperature after activation of the ion source, rapid decrease of the dielectric strength of the ceramic insulator, Also decreased, resulting in continuous effective ion source working time less than half an hour. The use of multiple shielding, extending the ceramic insulator and the bar at a lower operating temperature of the time, so that the ion source continuous effective working time reached one hour, basically meet the requirements of the auxiliary bombardment coating.