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超薄、平整的硅膜对于制作高灵敏度红外探测器是非常重要的。这种超薄硅膜的各向异性腐蚀技术,包括有机溶液EPW和无机溶液KOH及KOH+IPA(异丙醇)。从腐蚀速率、腐蚀表面质量、腐蚀停特性、腐蚀边缘形貌及腐蚀工艺的角度分析比较了两种腐蚀系统,分别制作出了约1μm厚的平整超薄硅膜,并研究了不同掩膜材料在腐蚀液中的抗蚀性,为高灵敏度红外探测器的制作奠定了工艺基础。
Thin, flat silicon film for the production of high sensitivity infrared detector is very important. This ultra-thin silicon film anisotropic etching technology, including organic solution EPW and inorganic solution KOH and KOH + IPA (isopropanol). Two kinds of corrosion systems were analyzed and compared from the aspects of corrosion rate, surface quality, corrosion stop characteristics, corrosion edge morphology and corrosion process, and the thin and thin silicon films with the thickness of about 1μm were respectively fabricated. The effects of different mask materials Corrosion in the corrosive liquid for the production of high sensitivity infrared detectors laid the foundation for the process.