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本文有摩擦力监测的划痕法研究了试样参数（基体硬度、膜厚、基体表面粗糙度等）对硬质摩膜（或软膜）的临界载荷Ｌｃ的影响．样品基材是Ｗ６Ｍｏ５Ｃｒ４Ｖ２、５ＣｒＭｎＭｏ、４５钢、Ａ３钢和不锈钢．膜层为磁控溅射离子镀ＴｉＮ膜和Ｔｉ膜、化学镀ＮｉＰＣＵ膜，以及在Ｓｉ３Ｎ４上溅射镀Ａｌ膜．结果发现离子度ＴｉＮ膜和Ｔｉ膜与ＮｉＰＣｕ膜规律不同，ＴｉＮ膜和Ｔｉ膜的临界载荷Ｌｃ随基体硬度的提高而提高，但当基体硬度接近和超过膜层硬度时，Ｌｃ变化不大；基体粗糙度增加时Ｌｃ下降；随膜厚的增加Ｌｃ提高．而化学镀ＮｉＰＣｕ膜的临界载荷Ｌｃ随基体硬度的提高而下降，随基体表面粗糙度的提高而增加．以Ｗ６Ｍｏ５Ｃｒ４Ｖ２为基体的ＮｉＰＣｕ膜，随膜厚的增加Ｌｃ变化不大．本文对上述规律的实质进行了初步探讨，并对目前生产中正在推广的工具钢磁控溅射离子镀ＴｉＮ膜的划痕法标准提出建议．
In this paper, the scratching method of friction monitoring was used to study the effect of sample parameters (substrate hardness, film thickness, substrate surface roughness, etc.) on the critical load Lc of a hard film (or soft film). The sample substrates were W6Mo5Cr4V2,5CrMnMo, 45 steel, A3 steel and stainless steel. The film layer is magnetron sputtered ion plating TiN film and Ti film, electroless NiPCU film, and sputtered Al film on Si3N4. The results show that the ionic TiN and Ti films have different regularities with NiPCu films. The critical load Lc of TiN film and Ti film increases with the increase of matrix hardness, but Lc has little change when the matrix hardness approaches and exceeds the hardness of the film. Lc decreased when roughness increased; Lc increased with the increase of film thickness. However, the critical load Lc of electroless NiPCu film decreases with the increase of matrix hardness, and increases with the increase of substrate surface roughness. NiCu films based on W6Mo5Cr4V2 showed little change with increasing film thickness. This article has carried on the preliminary discussion to the essence of the above law, and proposed the scratch method standard of the magnetron sputter ion plating TiN film which is being promoted in the present production.