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本文用Ｘ射线衍射仪和透射电子显微镜研究了 Ｃｕ基体离子镀 Ａl膜的相结构及 晶体学位向关系。 Ｘ射线衍射分析结果表明了 Ｃｕ－Ａl过渡层中各合金相的存在并发 现负偏压和极间距是影响合金相形成的主要因素。两者的变化将影响表面温度的升高。 每一个Ｃu－Ａl合金相图中存在的中间相在Ｃｕ基离子镀Ａ１膜的过渡层中的存在都 对应一个温度区间．在极间距一定的情况下，该温度区间对应着负偏压的区间。极间距 加大，该负偏压区间升高。用透射电镜观察了一定工艺参数下的 Ｃu基离子镀 Ａl膜， 发现了与Ｘ射线分析结果相对应的一系列合金相的存在．它们是，ＡＬ＿４Ｃｕ＿９（Ｃｏｍｐｌｅx Ｃｕｂｉｃ），ＡlＣｕ_3（Ｏｒｔｈｏｒｈｏｍｂｉｃ），ＣｕＡ１_２（Ｐｒｉｍｉtｉｖｅ Ｔｅｔｒａgｎａｌ）， ＡlＣｕ （Primitive Monoclinie)及AlCu_4(Cubic).观察了合金相的形态并确定了合 金相与基体 Ｃｕ及股 Ａl 间的晶体学位向关系。
In this paper, X-ray diffraction and transmission electron microscopy were used to study the phase structure and crystal orientation of Cu matrix Al-doped Al films. The results of X-ray diffraction analysis show that the existence of alloying phases in the Cu-Al transitional layer and the negative bias and the pole spacing are the main factors affecting the alloy phase formation. Both changes will affect the surface temperature. The presence of the mesophase in each phase of the Cu-Al alloy corresponds to the presence of a temperature interval in the transitional layer of the A1-Cu film. In the case of a constant pitch, this temperature interval corresponds to the negative bias interval. Increased pole spacing, the negative bias range increased. Transmission electron microscopy was used to observe the Cu-ion-doped Al film under a certain process parameters. The existence of a series of alloy phases corresponding to the X-ray analysis results was found. AlCu_3 (Orthorhombic), CuAl_2 (Primitive Tetragnal), AlCu (Primitive Monoclinie), and AlCu_4 (Cubic) were observed.The morphology of the alloy phase was observed and the relationship between the alloy phase and Cu and Al Crystal orientation relationship.