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建立了高纯金中40余种痕量杂质的电感耦合等离子体质谱测定方法。方法检出限为0．0006～0．21μg/L。考察了基体Au的谱干扰及基体效应，采用Cs内标补偿基体对待测信号的抑制作用。方法简单、快速、灵敏、准确。
A method for the determination of more than 40 kinds of trace impurities in high purity gold by inductively coupled plasma mass spectrometry has been established. The detection limit was 0.0006 ~ 0.21μg / L. The spectral interference and substrate effect of substrate Au were investigated. The inhibition of the signal to be measured was compensated by using Cs internal compensation substrate. The method is simple, fast, sensitive and accurate.