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在TiCl_4-C_6H_5CH_3-H_2和TiCl_4-C_6H_5-H_2-N_2体系中,以YG_8硬质合金为基体,用化学气相沉积(CVD)法,研究了温度,反应物输入浓度对沉积TiC和TiC_xN_y涂层的沉积速度,显微硬度和形貌的影响。结果表明:TiC沉积速度,显微硬度随沉积温度升高而增大,对TiC沉积层的形貌也有较大的影响。TiC和TiC_xN_y的沉积速度、显微硬度随反应物摩尔比(m_c/Ti)增加到某一最大值后又下降;m_c/Ti=1时,TiC硬度呈最佳值。m_c/Ti=0.87时,TiC_xN_y硬度出现最大值。此外,还对基体一涂层间是否出现η相进行了分析。并测定了在1223～1323K间TiC沉积反应的表观活化能为157.9kJ/mol。
In the system of TiCl_4-C_6H_5CH_3-H_2 and TiCl_4-C_6H_5-H_2-N_2, YG_8 cemented carbide was used as substrate to study the effect of temperature and reactant input concentration on the deposition of TiC and TiC_xN_y coatings by chemical vapor deposition Deposition rate, microhardness and morphology. The results show that the deposition rate and the microhardness of TiC increase with the increase of deposition temperature, which also has a great influence on the morphology of TiC deposit. The deposition rate and microhardness of TiC and TiC_xN_y increase with the molar ratio of reactants (m_c / Ti) to a certain maximum and then decrease. When m_c / Ti = 1, the hardness of TiC is the best. When m_c / Ti = 0.87, the maximum TiC_xN_y hardness appears. In addition, we also analyze whether there is η phase between the substrate and the coating. The apparent activation energy of TiC deposition at 1223-1323K was determined to be 157.9kJ / mol.