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一种新型的 MOCVD(Mettalic Organism CVD)装置 ,既金属有机化合物 CVD沉积装置。该装置具有结构简单 ,在低温、低压条件下能够实现化学气相沉积反应。气路系统全部采用进口零部件 ,保证反应气体的纯度。等离子体在反应过程中起到辅助和掺杂的作用。经实验表明该装置能够较好地完成氧化锌薄膜的研究工作 ,也可为进一步的研究提供必要的条件
A new type of MOCVD (Mettalic Organism CVD) device, a metal organic compound CVD deposition apparatus. The device has the advantages of simple structure and can realize the chemical vapor deposition reaction under the conditions of low temperature and low pressure. Pneumatic system all imported parts to ensure the purity of the reaction gas. The plasma plays a supporting and doping role in the reaction process. The experiment shows that the device can finish the research work of zinc oxide film well and also provide the necessary conditions for further research