氧化镁(MgO)薄膜作为等离子体显示器(PDP)的介质保护膜,其结构对于显示器的工作特性有重要影响。本文研究了MgO薄膜在制备过程中工艺条件对薄膜结构的影响。结果表明:MgO薄膜有(111)晶面的择优取向;基底温度越低或沉积速率越低,择优取向越明显;薄膜厚度或退火温度增加,各衍射强度增强;择优取向不变 Magnesium oxide (MgO) film as a plasma display panel (PDP) dielectric protective film, its structure has an important impact on the operating characteristics of the display. In this paper, the influence of process conditions on the structure of MgO thin films has been studied. The results show that: (1) the preferred orientation of (111) crystal plane exists in MgO films; the lower the substrate temperature or the lower the deposition rate, the more obvious the preferred orientation is; the film thickness or annealing temperature increases and each diffraction intensity increases;