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ZrO2是用于高抗激光损伤薄膜的重要材料,其结构及性能与沉积条件有很大关系。采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2薄膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。结果发现随着氧压的升高,ZrO2薄膜将由单斜相多晶态逐渐转变为非晶态结构,而随着基片温度的增加,薄膜将由非晶态逐渐转变为单斜相多晶态。同时发现随着氧压升高晶粒尺寸减小,而随着沉积温度增加,晶粒尺寸增大。氧压增加时工艺对表面粗糙度有一定程度的改善,而沉积温度升高,工艺对表面粗糙度的改善不明显。晶粒尺寸大小变化与表面粗糙度变化存在对应关系。激光损伤测量表明,氧压条件和沉积温度对ZrO2薄膜的抗激光损伤能力有着较大影响。
ZrO2 is an important material for high resistance to laser damage film, and its structure and properties have a great relationship with the deposition conditions. The effects of different oxygenation conditions and deposition temperature on the composition of ZrO2 thin films were analyzed by X-ray diffraction (XRD), and the surface roughness and laser damage thresholds of films prepared under different processes were measured. The results show that with the increase of oxygen pressure, the ZrO2 thin film will gradually change from monoclinic polycrystalline to amorphous, and with the increase of the substrate temperature, the film will gradually change from amorphous to monoclinic polycrystalline . It is also found that the grain size decreases as the oxygen pressure increases, while the grain size increases as the deposition temperature increases. When the oxygen pressure is increased, the surface roughness is improved to a certain degree. When the deposition temperature is increased, the surface roughness is not obviously improved by the process. There is a correspondence between the change of grain size and the change of surface roughness. Laser damage measurements show that the oxygen pressure conditions and deposition temperature have a greater impact on the laser damage resistance of ZrO2 thin films.