半导体材料的生产对还原性气体——氢气纯度的要求越来越高,因此必须控制和分析高纯氢气中微量氧、氮、甲烷、一氧化碳和二氧化碳的含量。已有在-196℃低温下用5A 分子筛浓缩并测定高纯氢气中氧和氮的报导。还简要报导过以 GDX-105在低温下浓缩氢气中杂质气体的测定方法。本文试验研究了在液氮温度下浓缩以及测定上述杂质气体的条 The production of semiconductor materials is increasingly demanding for reducing gas, hydrogen purity. Therefore, it is necessary to control and analyze trace amounts of oxygen, nitrogen, methane, carbon monoxide and carbon dioxide in high purity hydrogen. There have been reports of concentration of 5A molecular sieves at low temperature of -196C and determination of oxygen and nitrogen in high purity hydrogen. Also briefly reported GDX-105 at low temperature concentrated hydrogen gas impurity gas measurement method. This paper experimentally investigated the concentration of liquid nitrogen at the temperature and the above impurity gas stripe