扩散工艺是集成电路制造工艺的重要工艺之一。集成电路工业的发展已对扩散的杂质浓度分布的准确计算提出了越来越高的要求。本文通过介绍集成电路制造中掺杂杂质扩散,包括扩散原理、扩散方程的内容,对半导体集成电路制造工艺中的扩散工艺作了分析,为进一步深造和从事半导体器件制造等工作打下坚实的基础。 Diffusion process is one of the important process of integrated circuit manufacturing process. The development of integrated circuit industry has put forward higher and higher requirements on the accurate calculation of diffusion impurity concentration distribution. This paper introduces the diffusion of doped impurities in integrated circuit manufacturing, including the diffusion principle and diffusion equation, and analyzes the diffusion process in the manufacturing process of semiconductor integrated circuits, laying a solid foundation for further study and manufacture of semiconductor devices.