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采用闭合场非平衡磁控溅射离子镀技术在单晶硅(111)衬底上沉积了CrTiAlCN镀层,研究了不同C靶电流CrTiAlCN物相组成,并分析了镀层中主要元素的化学态。X射线衍射分析表明,当C靶电流IC从0增大到2.4 A时,镀层由晶态向非晶态转变;X射线光电子能谱分析表明,碳元素主要以C-C、C-Cr和C-Ti键形式存在;N元素是主要以CrN、Cr2N和TiN的形式存在;Cr元素主要以CrN、Cr2N及CrCx的形式存在。
CrTiAlCN coatings were deposited on monocrystalline Si (111) substrate by closed-field unbalanced magnetron sputtering. The phase compositions of CrTiAlCN with different C target currents were studied and the chemical states of the major elements in the coatings were analyzed. X-ray diffraction analysis showed that when the C target current IC increased from 0 to 2.4 A, the coating changed from crystalline state to amorphous state. The X-ray photoelectron spectroscopy analysis showed that the main element of carbon was CC, C-Cr and C- Ti bond exists; N element is mainly in the form of CrN, Cr2N and TiN; Cr element is mainly in the form of CrN, Cr2N and CrCx.