论文部分内容阅读
用射频磁控溅射法在外磁场中淀积 Ｎｉ Ｏ／ Ｎｉ８１ Ｆｅ１９ 双层膜， 利用淀积磁场（ Ｈｄｅ） 诱导易轴并确定交换耦合场方向． 研究了淀积磁场对 Ｎｉ Ｏ／ Ｎｉ Ｆｅ 双层膜特性的影响， 结果表明， 淀积磁场改善了双层膜的磁滞回线的矩形度， 减小矫顽力， 增强交换耦合作用． 反铁磁性层 Ｎｉ Ｏ 和铁磁性层 Ｎｉ Ｆｅ 的厚度对矫顽力和交换耦合作用有很大的影响． 在５６ｋ Ａ／ｍ 的磁场中制备的 Ｎｉ Ｏ （５０ｎｍ） ／ Ｎｉ Ｆｅ （２５ｎｍ） 双层膜的易轴矫顽力 Ｈ Ｃ为１ ． ９ｋ Ａ／ｍ ， 交换耦合场 Ｈ Ｅ Ｘ为２ ． ６ｋ Ａ／ｍ ， 临界温度 Ｔｃ 为１５０ ℃， 截止温度 Ｔ Ｂ为２３０ ℃
The Ni O / Ni81 Fe19 bilayer films were deposited by RF magnetron sputtering in an external magnetic field. The magnetic field (Hde) was used to induce the easy axis and determine the exchange coupling field direction. The effect of deposited magnetic field on the properties of NiO / NiFe bilayers was studied. The results show that the magnetic field of deposition improves the squareness of the hysteresis loop, decreases the coercive force and enhances the exchange coupling. The thicknesses of the antiferromagnetic layer NiO and the ferromagnetic layer NiFe have a great influence on the coercive force and the exchange coupling effect. The NiO (50 nm) / NiFe (25 nm) bilayer film prepared in a magnetic field of 56 kA / m has an easy axis coercivity Hc of 1. 9k A / m, exchange coupling field H E X is 2. 6k A / m, the critical temperature Tc is 150 ° C, and the cut-off temperature T B is 230 ° C