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采用微波等离子体化学气相沉积（ MPCVD）法成功地在多孔硅上沉积出均匀、致密的金刚 石膜。光致发光测量表明，金刚石膜可以有效稳定多孔硅的发光波长和发光强度，具有明显的钝 化效应。金刚石膜的这个特点再加上高硬度特性使金刚石膜成为多孔硅的一种潜在的钝化膜。
Microwave plasma chemical vapor deposition (MPCVD) method was used to successfully deposit a uniform and dense diamond film on porous silicon. Photoluminescence measurements show that the diamond film can effectively stabilize the luminescence wavelength and luminescence intensity of porous silicon with obvious passivation effect. This feature of diamond film, combined with its high hardness, makes diamond films a potential passivation film for porous silicon.