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The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The results show that hexagonal Mo(Si, Al)2 as a main phase and a little amount of the lower disilicide Mo5Si3 was formed on Mo substrate through the halide-activated pack cementation method. The resultant Si-Al coating on Mo substrate exhibits excellent cyclic oxidation resistance. The excellent cyclic oxidation resistance of the coatings is attributed to the formation of alumina on the coatings during the oxidation.
The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The results show that hexagonal Mo (Si, Al) 2 as a main phase and The little amount of the lower disilicide Mo5Si3 was formed on the Mo substrate through the halide-activated pack cementation method. The excellent cyclic oxidation resistance of the coatings is attributed to the formation of alumina on the coatings during the oxidation.