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利用金属气化真空弧离子源(以下简称Mevva)形成金属等离子体,然后从中引出离子束是一种很有效的产生大束流金属离子束的技术。周期表上几乎所有的固体金属都可通过这种技术产生几安培的金属离子脉冲束流。最近进行的一些试验还证实利用这种技术还可获得金属离子的直流束流。它所采用的离子束引出电压可以高达100keV。由于真空弧等离子体产生的离子一般都带有多电荷,因此,离子能量实际上可高达几百keV。这种离子源可用于重离子同步加速器的注入装置、金属离子注入以及其它应用领域。美国的Berkeley大学和世界上其它国家的科研机构分别研制出了好几种结构不同的这种类型的离子源。它们具有下述特点:阴极数目多、能够很方便地迅速更换18种阴极材料,束的直径可以大到50cm,也可以小到姆指那么大,本文将根据Berkeley大学所承担的Mevva离子源研制规划的发展前景,对这种离子源的设计特点、使用性能和束的特性等作一综述性的介绍。
The use of a metal vaporized vacuum arc ion source (Mevva) to form a metal plasma and then extract the ion beam therefrom is a very efficient technique for generating large beam metal ion beams. Almost all solid metals in the periodic table can be used to generate several amperes of pulsed metal ion current beams. Some recent experiments have also confirmed the use of this technology can also be obtained direct current metal ion beam. It uses ion beam extraction voltage up to 100keV. Since the ions produced by the vacuum arc plasma are generally multi-charged, the ion energy can actually be as high as a few hundred keV. This ion source can be used in heavy ion synchrotron infusions, metal ion implantation, and other applications. Several Berkeley universities in the United States and research institutes in other countries around the world have developed several different types of ion sources. They have the following characteristics: the cathode number, can quickly and easily replace 18 cathode materials, the beam diameter can be as large as 50cm, can also be as small as the thumb means, this article will be undertaken by Berkeley University Mevva ion source Planning the development prospects of the ion source design features, performance and beam characteristics for a general introduction.