超净技术是保证工作环境特别干净的技术,它是半导体器件制造过程中的一项重要技术.随着半导体器件由晶体管、集成电路不断发展到大规模集成电路和超大规模集成电路,对工作环境的要求也愈来愈高.目前,元件的刻线间距,有的已经达到亚微米级,器件上光致抗蚀剂的厚度也只有0.2微米.因此,即使 Ultra-clean technology is a particularly clean technology to ensure that the working environment is an important technology in the manufacturing process of semiconductor devices.With the continuous development of semiconductor devices from transistors and integrated circuits to large-scale integrated circuits and very large-scale integrated circuits, The demand is also getting higher and higher.At present, the pitch spacing of the components, some have reached the sub-micron level, the thickness of the photoresist on the device is only 0.2 microns.Therefore, even if